International Standard
ISO 21859:2019
Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
Reference number
ISO 21859:2019
Edition 1
2019-06
International Standard
Read sample
ISO 21859:2019
71990
Published (Edition 1, 2019)

ISO 21859:2019

ISO 21859:2019
71990
Language
Format
CHF 42
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Abstract

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

General information

  •  : Published
     : 2019-06
    : International Standard under systematic review [90.20]
  •  : 1
     : 4
  • ISO/TC 206
    81.060.30 
  • RSS updates

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