Resumen
This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
This document is not intended to cover the use of special multilayered systems such as delta doped layers.
Preview
Previsualice esta norma en nuestra Plataforma de navegación en línea (OBP)
Informaciones generales
-
Estado: PublicadoFecha de publicación: 2022-11Etapa: Norma Internacional publicada [60.60]
-
Edición: 3Número de páginas: 17
-
Comité Técnico :ISO/TC 201/SC 4ICS :71.040.40
- RSS actualizaciones
Ciclo de vida
-
Anteriormente
RetiradaISO 14606:2015
-
Ahora
Got a question?
Check out our FAQs
Customer care
+41 22 749 08 88
Opening hours:
Monday to Friday - 09:00-12:00, 14:00-17:00 (UTC+1)